Machined cuff for gingival adaptation
NTA Tissue Level is a tissue-level fixture with an SLA-treated endosseous surface and a machined gingival cuff. Connection is an 8° taper with an internal octagon index. Dual-thread geometry (0.8 mm pitch, 0.45 mm depth, 1.5° body taper) is specified for primary stability. Placement and restoration follow the IFU.
The Tissue Level fixture has an SLA endosseous surface and a machined cuff specified for bone and soft-tissue contact.
Machined cuff: A turned neck for gingival adaptation and plaque control at the soft-tissue level.
Macro and micro roughness: Titanium is corundum-blasted and acid-etched in a heated HCl solution, producing 2–4 μm pits intended to support osseointegration.
Non-porous finish: The surface is not micro-porous, so closed recesses for bacterial colonization are not created.
Surface chemistry: XPS of the chemical surface confirms titanium dioxide (TiO2).
Connection specified for a precise implant–abutment seat:
8° conical connection: Specified to reduce stress at the fixture and limit micro-movement and micro-leakage at the interface.
Internal octagon index: Indexes the abutment so it seats at the specified angle.
1.5° body taper: Dual-thread screw (0.8 mm pitch, 0.45 mm depth) specified for primary stability in softer bone when the osteotomy follows the IFU.
Placement and handling features:
Self-tapping: Specified to increase primary stability when bone quality or volume is limited. A sharp cutting edge supports self-tapping in the osteotomy.
Rounded apex: Intended to reduce tissue trauma when the fixture is placed toward the maxillary sinus, per IFU.
Root form and body: Intended for the insertion path and primary stability, reducing contact with adjacent roots.
Cutting edges: Osteotomy is prepared with three-edged burs. Frictional heat and insertion trauma stay low when the sequence in the IFU is followed.
Mount-free: Placed with a dedicated fixture driver specified for a secure grip and release. No mount component.
Video of the osteotomy and placement sequence. Follow the IFU.
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